Product Introduction:
Name: Nitrogen trifluoride
Chemical formula: NF3
Packaging specifications: 44L, 17L
Purity (%): 99.99%
Melting point: -206.8°C
Boiling point: -129°C
Critical temperature: -39.3°C
Critical pressure: 4.46Mpa
Nitrogen trifluoride is a colorless, odorless, stable gas at room temperature and a strong oxidant. Nitrogen trifluoride is an excellent plasma etching gas in the microelectronics industry. It is decomposed into active fluoride ions during ion etching. These fluoride ions have excellent etching rate and selectivity (to silicon oxide and silicon) for silicon and tungsten compounds. When etching, it does not leave any residue on the surface of the etched object. It is a very good cleaning agent and has been widely used in chip manufacturing and high-energy lasers.
Technical parameters:
| Project Name | Purity Index (%) | Use | ||
| Nitrogen Trifluoride | ≥99.99 | NF3 is an excellent plasma etching gas in the microelectronics industry. For etching silicon and silicon nitride, the mixed gas of NF3 and CF4 + O2 has a higher etching rate and selectivity, and does not pollute the surface. | ||
| Impurity Content (ppm) | N2 | ≤5 | ||
| O2+Ar | ≤3 | |||
| CO2 | ≤5 | |||
| CO | ≤1 | |||
| CF4 | ≤40 | |||
| H2O | ≤1 | |||
| SF6 | ≤5 | |||
| HF | ≤1 | |||
| N2O | ≤5 | |||
